- Porous Silicon System PSB Double cell HF-bath for porous silicon formation with wafer holders for full-wafer porosification or tests
- Porous Silicon System PSB Single Cell Single cell HF-bath for porous silicon formation
- PS Power Supply and Control Software Flexible programmable power supply with control software for time-based current profiles
Porous Silicon: Porous Silicon System PSB
Double cell HF-bath for porous silicon formation.
The PSB wet etching system for porous silicon is a complete solution for porous silicon formation and the electropolishing of silicon. Together with our Porous Silicon Power Supply PS2, AMMT offers an all-in-one solution for this range of fabrication methods. The PSB is available for 4", 6" and 8" wafer sizes. The robust etching bath is built from welded polypropylene (PP) and holds approximately 5 liters of HF or HF-ethanol solution. For safety purposes, the bath is equipped with connections for continuous HF vapor extraction and is mounted by threaded bolts to the surrounding wet bench. PTFE drain valves are connected for direct HF disposal. As an option, two optical windows at the left and right side of the bath allow light-assisted porous silicon formation. Two HF resistant sapphire windows, supported by thick quartz disks as protection against fracture, can be mounted into sealed flanges. If illumination is not necessary, blind PP covers can be mounted instead.
The wafer is mounted into a removable wafer holder, which is sealed with double O-rings. The wafer holder is then placed in front of the circular opening in the separation plate and is finally fixed in place by a quarter turn of the bayonett catch. Once the catch is closed, both HF compartments are electrically insulated in the MOhm-range. Two platinum mesh electrodes, one in each cell, are used to contact the wafer from both sides. In order to ensure a homogeneous electrical field, the electrodes are of the same size as the wafer. If a completely metal-ion free environment is required, the Pt electrodes can optionally be replaced by Si sacrificial electrodes.
Available Options
For more information, please download our product info below or inquire for details.
For a complete list of our product information sheets please see our Documentation Download Section.
Double cell HF-bath for porous silicon formation.
The wafer is mounted into a removable wafer holder, which is sealed with double O-rings. The wafer holder is then placed in front of the circular opening in the separation plate and is finally fixed in place by a quarter turn of the bayonett catch. Once the catch is closed, both HF compartments are electrically insulated in the MOhm-range. Two platinum mesh electrodes, one in each cell, are used to contact the wafer from both sides. In order to ensure a homogeneous electrical field, the electrodes are of the same size as the wafer. If a completely metal-ion free environment is required, the Pt electrodes can optionally be replaced by Si sacrificial electrodes.
Images. Click to enlarge.
Besides regular wafer holders for 2”, 3”, 4”, 5”, 6” and 8” wafers we also offer unique wafer holder for the porous silicon system.
| » | Test wafer holder The test wafer holder allows to perform up to five etches on a single wafer thus helping to increase the speed of developement of a set of parameters. |
| » | Chip holder Individual chip holders can be manufactured customer specifically for almost any chip size. |
Images. Click to enlarge.
| » | PSB - Double cell HF-bath for porous silicon formation |
| » | Sapphire windows |
| » | Pneumatic Operations for bayonet catch (for PSB6/PSB8 only) |
| » | Etchant cooling tubes |
| » | Contactless etchant level sensor |
For more information, please download our product info below or inquire for details.
For a complete list of our product information sheets please see our Documentation Download Section.